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The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate, on a sole source basis, with Oxford Instruments America, Inc. of 300 Baker Ave STE 150, Concord, MA 01742-2204 for the purchase of the following systems to be utilized by NIST’s Physical Measurements Laboratory (PML). The statutory authority for this acquisition is 41 USC 3304(a)(1), as implemented under the authority of 41 U.S.C. 1901.

1 QTY, PlasmaPro® 100 Cobra 300 Fluorine with ALE and table from -150 C to 400 C. 12 line gas pod populated with 8 gasses. Pfeiffer chamber and Loadlaock turbo pumps. 4 year warranty (one-year base + three, one-year options)

1 QTY, PlasmaPro® 100 Cobra 300 Chlorine with ALE and table from -150 C to 400 C. 12 line gas pod populated with 8 gasses. Pfeiffer chamber and Loadlaock turbo pumps. 4 year warranty (one-year base + three, one-year options).

1 QTY, PlasmaPro® 100 Cobra 300 ICPCVD and table from -150 C to 400 C. 12 line gas pod populated with 5 gasses. Pfeiffer chamber and Loadlaock turbo pumps. 4 year warranty (one-year base + three, one-year options)

1 QTY, PlasmaPro® 80 RIE + ICP (For SiNx iostropic etching). 4 year warranty (one-year base + three, one-year options).

1 QTY, PlasmaPro® 80 RIE + PE (For SiNx iostropic etching). 4 year warranty (one-year base + three, one-year options).

NIST-Boulder has a state-of-the-art research laboratory (the Katharine Blodgett Gebbie Building) to support the most sensitive research done at NIST. Included in this building is a Class 100 microelectronics fabrication facility, called the Boulder Micro-fabrication Facility (BMF). To ensure that the BMF can still produce its NIST mission critical devices, replacement tools are required.

Based on the Government’s market research, only Oxford Instruments of America, Inc. can provide a commercially available product that meets the following minimum specifications:

Flourine ICP System:

• Guaranteed Atomic Layer Etching (ALE) processes


• Two pressure gauges for measuring low and high pressure plasmas


• Cryo and high temp etching system


• Mechanical clamp for clamping substrates for this system


• Unlimited recipe storage


• Component visualization (valves, mass flow controllers, power supplies, etc)

Chlorine ICP System:

• Guaranteed ALE processes


• Two pressure gauges for measuring low and high pressure plasmas


• Cryo and high temp etching system


• Mechanical clamp for clamping substrates for this system


• Unlimited recipe storage


• Component visualization (valves, mass flow controllers, power supplies, etc).

PECVD System:

• ICP plasma generation


• Mechanically clamp


• Provide backside helium for substrates


• Deposit films at controlled low temperatures (40 C) and controlled higher temperatures (300-400 C)


• Unlimited recipe storage


• Component visualization (valves, mass flow controllers, power supplies, etc).

RIE Metals System:

• Voltage bias can be switched to either upper or lower electrode without changing any hardware to create more isotropic etch


• Etching capability at 80 C


• 12 gas lines


• Both laser and Optical Emission Monitoring System (OES) endpoint


• Open-load parallel plate RIE system


• Unlimited recipe storage


• Component visualization (valves, mass flow controllers, power supplies, etc).

RIE Dielectrics System:

• Heated stage capable of etching at 80 C


• Control through two separate pressure gauges


• 12 gas lines


• Both laser and Optical Emission Monitoring System (OES) endpoint


• Open-load parallel plate RIE system


• Unlimited recipe storage


• Component visualization (valves, mass flow controllers, power supplies, etc).

Oxford Instruments America, Inc. is the sole manufacturer and distributor of the commercial equipment that meets the required minimum specifications.

The North American Industry Classification System (NAICS) code for this acquisition is 334516 – Analytical Laboratory Instrument Manufacturing, with a small business size standard of 1,000 employees.

A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement.

No solicitation package will be issued. This notice of intent is not a request for quotations; however, all responsible sources interested may identify their interest and capability to respond to this requirement. Interested parties that believe they can satisfy the requirements listed above must identify their capability in writing before the response date of this notice. Only responses received by 10:00 a.m. Eastern Standard Time on February 2, 2023 will be considered by the government. Responses shall be submitted via email to ian.robinson@nist.gov and donald.collie@nist.gov.

Contracting Office Address:

100 Bureau Drive

Bldg. 301, Mail Stop 1640

Gaithersburg, Maryland 20899-0001

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